Main > ELECTRONICS. > DiElectrics > High-k DiElectrics > Tantalum Oxide (Ta2O5) > Co.: USA. Ai. (Precursor>Mfr.)

---

Co.: USA. Ai. (Precursor>Mfr.)'s subsections
Company
Deposition Technique: CVD
Gate & Capacitor DiElectrics
Name
Precursor: Ta PentaEthOxide

Co.: USA. Ai. (Precursor>Mfr.)'s products
This section has no products