Main > ELECTRONICS. > Chemicals > Silica > Patent > Claims > Claim 1: Production Process with > Ti Impurity Concn.=0.3-1.2 ppm.: > a) Alkali Silicate Aq. Soln.+ > InOrganic Acid=Acidic Silica Sol; > b) Sol+Hydrogen Peroxide Treat.; > c) Adjust pH=0-5 by NaOH Addition > ; d) Purify Sol by Contact with > Cationic Ion Exchange Resin; e) > Neutralize Sol with Aq. Alkali Soln > .; Add Sol to Aq Ammonium Salt Soln > .; g) Separate Precipitated Silica.

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