| PATENT ASSIGNEE'S COUNTRY | BASF AG |
| UPDATE | 06.99 |
| PATENT ASSIGNEE | This data is not available for free |
| PATENT CLAIMS |
Claim 1: Positive working radiation sensitive mixt.: - Water-insoluble organic binder contg. acid labile groups & is rendered soluble in aq. alkaline soln by action of acid - Organic compd which produces acid under action of light Trialkyl Sulfonium Salt - Strongly basic organic quat. ammonium hydroxide (5 - 50 % Claim 8: Relief structure prodn. process comprising: - Applying mixt. (Claim 1) to substrate in thickness 0.1 - 5 micro-m - Drying at 70 - 140C - Imagewise exposing the dried & coated substrate to UV ra diation - Heat. to 40 - 160C & - Developing substrate with aq. alkaline soln |
| PATENT PHOTOCOPY | Available on request |
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