| PATENT ASSIGNEE'S COUNTRY | Japan |
| UPDATE | 08.99 |
| PATENT ASSIGNEE | Toshiba KK |
| PATENT CLAIMS |
Resist for alkali development - Alkali-soluble resin having alicyclic structure - Photoacid generator - Me-CO-N(OH)-CO-C6H11 |
| PATENT PHOTOCOPY | Available on request |
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