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Product Positive. Japan. Ts

PATENT ASSIGNEE'S COUNTRY Japan
UPDATE 08.99
PATENT ASSIGNEE Toshiba KK
PATENT CLAIMS Resist for alkali development
- Alkali-soluble resin having alicyclic structure
- Photoacid generator
- Me-CO-N(OH)-CO-C6H11
PATENT PHOTOCOPY Available on request

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