| PATENT ASSIGNEE'S COUNTRY | Japan |
| UPDATE | 07.99 |
| PATENT ASSIGNEE | This data is not available for free |
| PATENT CLAIMS |
Chemical-sensitization organic solvent soln compn - Alkali-soluble resin (100 parts) which is a polyhydroxystyre ne resin with MW > 2000 - Acid-crosslinkable compd (3-70 parts) - Photoacid generator oximesulfonate (0.5-30 parts) of formula: R-C(CN)=N-O-SO2-R'; R,R' = Nonaromatic group |
| PATENT PHOTOCOPY | Available on request |
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