| PATENT ASSIGNEE'S COUNTRY | Japan |
| UPDATE | 09.99 |
| PATENT ASSIGNEE | This data is not available for free |
| PATENT CLAIMS |
Chemical amplification type compn comprising Photoacid generator; Crosslinker (acting in presence of acid) & Alkali-soluble resin comprising mixt - Hydroxystyrene copolymer, MW 2000-4000 & polydispersi ty = 1-2 & - Poly(Hydroxystyrene) Wherein dissolution rate of resin comp. at 23C in 2.38% by wt tetramethylammonium hydroxide aq soln is 80-300 nm/s Wherein said copolymer comprising hydroxystyrene units & non-hydroxystyrene units where -OH is replaced with an alkali-soly suppressing group which is not liberated by acid |
| PATENT PHOTOCOPY | Available on request |
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