| PATENT ASSIGNEE'S COUNTRY | Taiwan |
| UPDATE | 06.99 |
| PATENT ASSIGNEE | This data is not available for free |
| PATENT CLAIMS |
Method for cleaning a spray stream nozzle used in dispensing an aq TMAH photoresist developer upon a photoexposed blanket photoresist layer formed over a semiconductor substrate - Providing a spray stream nozzle having a min. of one aperture formed therein - Providing through the aperture within the nozzle a vol. of an aq TMAH soln sufficient to develop a photoexposed blan ket photoresist layer beneath nozzle, where the aperture within nozzle are formed in bottom surface of nozzle which is positioned & spaced paralell from the planar surface of the semiconductor substrate - Providing then through the aperture within nozzle a vol. of solvent, the vol. of solvent not being susceptible to clogging the nozzle |
| PATENT PHOTOCOPY | Available on request |
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