| PATENT ASSIGNEE'S COUNTRY | Japan |
| UPDATE | 02.00 |
| PATENT ASSIGNEE | Shin-Etsu Chemical |
| PATENT CLAIMS |
Block-graft copolymer with degree of polymn > 210 & comprising - CH2=CH-C6H4-O-(-CH2CH2O-)n-H; n = 1-100 polymer block A with degree of polymn > 10 - CH2=CH-C6H4-CH2CH2-CH=CH2 block B & degree of polymn > 200 |
| PATENT PHOTOCOPY | Available on request |
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