| PATENT ASSIGNEE'S COUNTRY | Japan |
| UPDATE | 02.00 |
| PATENT ASSIGNEE | Shin-Etsu Chemical |
| PATENT CLAIMS |
- Organic solvent - Photoacid generator - Base resin with MW 3,000-300,000 & contg monomer of formula: CH2=CH-C6H3(OH)2 |
| PATENT PHOTOCOPY | Available on request |
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