| PATENT ASSIGNEE'S COUNTRY | Japan |
| UPDATE | 06.99 |
| PATENT ASSIGNEE | Shin-Etsu Chemical |
| PATENT CLAIMS |
Mfg process by two-stage liquid-phase reaction between HCl & MeOH - Early stage effected in stoichiometric excessive HCl atm. - Last stage in stoichiometric excess of MeOH |
| PATENT PHOTOCOPY | Available on request |
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