Main > ELECTRONICS. > Chemical Vapor Deposition > Copper > Precursor > Allyl. Liquid Precursor

Product USA. S

PATENT ASSIGNEE'S COUNTRY USA
UPDATE 01.00
PATENT ASSIGNEE Sharp Laboratories of America Inc
PATENT CLAIMS Cu(HFAC) (H2C=CHCH2R)-derived volatile precursor compd synthesis method
- Forming a uniformly mixed soln of Cu2O in solvent
- Introducing an allyl-derived ligand to soln & mixing
- Introducing HFAC to soln & mixing
- Solvent removal
- Filtering
PATENT PHOTOCOPY Available on request

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