| PATENT ASSIGNEE'S COUNTRY | USA |
| UPDATE | 12.99 |
| PATENT ASSIGNEE |
California Institute of Technology (Pasadena; Ca) Sandia (Albuquerque; N.Mex) |
| PATENT CLAIMS |
- Mixing gaseous WF6, NH3 & Si/H gaseous compd & heating the substrate - Directing the gas mixt to heated substrate surface to form W-Si-N thin film |
| PATENT PHOTOCOPY | Available on request |
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