| PATENT ASSIGNEE'S COUNTRY | Korea |
| UPDATE | 10.99 |
| PATENT ASSIGNEE | Samsung Electronics (Suwon) |
| PATENT CLAIMS |
Wiring mfg method - Depositing Cr layer on transparent insulating substrate - Depositing Cr nitride on Cr layer - Forming photoresist layer on Cr nitride layer - Photoresist patterning - Wetr etching Cr & Cr nitride layers using photoresist as mask |
| PATENT PHOTOCOPY | Available on request |
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