| PATENT ASSIGNEE'S COUNTRY | USA |
| UPDATE | 07.99 |
| PATENT ASSIGNEE | Reckitt & Colman (Wayne; NJ) |
| PATENT CLAIMS |
Aq low residue compn - Quat ammonium surfactant compd (0.05-0.3%) having ger micidal properties - Solvent system (0.001-6.15%) consisting of dipropylene glycol n-butyl ether & hexanol - Amine oxide compd (0.1-3%) - Alkanolamines (0.1-0.5%) - Water (bal.) |
| PATENT PHOTOCOPY | Available on request |
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