| PATENT ASSIGNEE'S COUNTRY | Japan |
| UPDATE | 05.99 |
| PATENT ASSIGNEE | Hoya (Tokyo) |
| PATENT CLAIMS |
2-Hydroxyethyl methacrylate (I) based polymer mfg method - Polymn (I) in presence of inert chlorinated compd |
| PATENT PHOTOCOPY | Available on request |
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