| PATENT ASSIGNEE'S COUNTRY | USA |
| UPDATE | 07.99 |
| PATENT ASSIGNEE | This data is not available for free |
| PATENT CLAIMS |
Radiation-sensitive compn comprising sulfonium trifluorome thane sulfonate (0.1-20%) (forming acid under radiation) & copolymer of - CH2=CH-C6H4-O-CMe-OMe - Ch2=CH-C6H4-OH - CH2=CH-C6H10-O-CHMe-OMe - CH2=CH-C6H10-OH |
| PATENT PHOTOCOPY | Available on request |
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