| PATENT ASSIGNEE'S COUNTRY | Japan |
| UPDATE | 01.00 |
| PATENT ASSIGNEE | This data is not available for free |
| PATENT CLAIMS |
Resist compn comprising - Polymer having groups cleavable by acid; wherein poly mer having as groups cleavable by acid, groups contg a substituted allyloxy group: CH2=CH-CX2-O-; X = halogen - Compd which can forn acid upon exposure to active rays |
| PATENT PHOTOCOPY | Available on request |
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