| PATENT ASSIGNEE'S COUNTRY | Japan |
| UPDATE | 08.99 |
| PATENT ASSIGNEE | This data is not available for free |
| PATENT CLAIMS |
A degrasing method comprising dipping an object in an alka line degreasing soln contg - Alkali silicate (0.01-1 g/l calculated as Si concn) - Nonionic surfactant (0.01-10 g/l) having HLB value (=20x Mw/M, where Mw is wt. of hydrophilic part & M is MW) of 5-11 & structure: R-O-(EO)m(AO)nH & pH 10.5-12.5 where R = alkyl with 8-12 C, EO is ethylene oxide, AO is alkylene oxide (propylene oxide &/or butylene oxide), represents an addition molar number of EO being 3-7, n = addition molar number of AO 1-6 & m & n satisfy n < m < 3n Said soln being stored in degreasing treat. vessel For alkaline-degreasing said object while stirring said soln stored in said vessel by vibrating diaphragms being set in said vessel |
| PATENT PHOTOCOPY | Available on request |
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