| METHOD | See "Patent Claim" |
| PATENT ASSIGNEE'S COUNTRY | USA |
| UPDATE | 06.99 |
| PATENT ASSIGNEE | This data is not available for free |
| PATENT CLAIMS | Contacting halogen gas stream with high silica zeolite for time sufficient to reduce water content to < 100 ppb, said high silica zeolite comprising zeolitic structure & silica:alumina ratio > 20:1 & being unaffected by said corrosive gas |
| PATENT PHOTOCOPY | Available on request |
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