| PATENT ASSIGNEE'S COUNTRY | Japan |
| UPDATE | 12.99 |
| PATENT ASSIGNEE | Mitsubishi Gas Chemical (Tokyo) |
| PATENT CLAIMS |
Mfg process - Reacting naphthalene & phenol in the presence of mixt of HF & BF3 as catalyst at < 350C Wherein condensate has softening point < 150C, MW 250-800 & phenolic hydroxyl equiv. 140-850 g/eq., phenol being used in amount of 1.5-20 moles/mole of naphthalene |
| PATENT PHOTOCOPY | Available on request |
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