Main > ELECTRONICS. > SemiConductor > Device > Photoresist > Positive Photoresist > Deep UV (157-nm) Photoresist > Polymer > FluoroPolymer > TriCycloNonene. Hexa-F Iso-PrOH > Tert.-Bu Acrylate. Tetra-F Ethylene > 4th Not Disclosed CoMonomer? > CoPolymer

Product USA. D

STUDY The team also has found that the polymer's dissolution and blending properties can be improved by placing hexafluoroisopropanol groups on the tricyclononene framework
UPDATE 03.03
AUTHOR This data is not available for free
LITERATURE REF. This data is not available for free

Want more information ?
Interested in the hidden information ?
Click here and do your request.


back