| DEVELOPMENT | Co. has been conducting development work with a major U.S. semiconductor producer that will soon begin using C4F8O as a chamber-cleaning gas |
| CLASSIFICATION | Market |
| ECOLOGY | C4F8O generates 90% fewer PFC emissions than C2F6 does |
| ECONOMY | while reducing gas costs by 60% |
| UPDATE | 07.00 |
| USES | marketed as a drop-in replacement for C2F6. |
| COMPANY | This data is not available for free |
| LITERATURE REF. | This data is not available for free |
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