| PATENT ASSIGNEE'S COUNTRY | Japan |
| UPDATE | 06.99 |
| PATENT ASSIGNEE | This data is not available for free |
| PATENT CLAIMS |
Chemically amplified resist compn - Resin which has an acidic functional group protected by an acid decomposable group & which is converted into an al kali-soluble resin when the acid-decomposable protective group is decomposed - Photoacid generator which is a compd generating an acid by irradiation & selected of onium salts - Solvent which is mixt of an alkyl lactate with propylene gly col alkyl ether |
| PATENT PHOTOCOPY | Available on request |
|
Want more information ? Interested in the hidden information ? Click here and do your request. |