| OBSERVATION'S |
The deep-UV generation of photoresist is the first to employ chemical amplification technology: along with the basic resist polymer "backbone" and ancillary components, the deep-UV system contains a photo-acid generator, or PAG. Co.'s Contact explains that when ultraviolet light hits the PAG, an acid is generated that deprotects a switching group on the resist polymer, making the polymer soluble in the photoresist developer.
The polymer backbone in 248-nm photoresists is polyhydroxystyrene (PHS). Co.'s Contact claims that unique PAG technology and other technical advances helped his company capture the leading North American market share for 248-nm resists
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