| PATENT ASSIGNEE'S COUNTRY | USA |
| UPDATE | 08.99 |
| PATENT ASSIGNEE | This data is not available for free |
| PATENT CLAIMS |
Chemically-machinable glass-magnet compn comprising photosensitive chemically machinable glass having a magnetic material in admixt therewith; wherein - Said photosensitive chemically machinable glass is formed of SiO2-Li2O-Al2O3 contg photosensitive materials selec ted from Ag, Au & Cu & CeO2 sensitizer - Magnetic material is Ni-Cu-Zn ferrite |
| PATENT PHOTOCOPY | Available on request |
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