| MECHANISM OF ACTION | team proposes that these unexpectedly thick layers of silica grow by a previously unknown catalytic mechanism. This mechanism involves the tethering of an aluminum-oxygen bond to the surface and repeated insertions of silanol into this bond to form a siloxane polymer. The polymer also undergoes cross-linking, eventually solidifying into SiO2 |
| METHOD | By exposing a surface alternately to vapors of trimethylaluminum and tris(tert-butoxy)silanol, authors are able to deposit very thin layers of alumina interspersed between thicker layers of silica at rates more than 100 times faster than those reported for atomic layer deposition (ALD) of silica The layers are amorphous and highly conformal, meaning that long, narrow holes can be lined or filled uniformly. ALD typically deposits only a partially filled monolayer during each deposition step. By contrast, dozens of silica monolayers are deposited in one step of the new process. |
| UPDATE | 10.02 |
| USES | process to improve the production of microelectronic, optical, and other devices |
| AUTHOR | This data is not available for free |
| LITERATURE REF. | This data is not available for free |
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