Main > POLYMERS > Fluoro-Polymer > Poly(ChloroTriFluoroEthylene) > Production. > Emulsion Free Radical Polymn. > Surfactant-Free Process.

Product USA. A

PATENT NUMBER This data is not available for free
PATENT GRANT DATE April 2, 2002
PATENT TITLE Method of manufacturing fluoropolymers

PATENT ABSTRACT The present invention provides a novel, optionally surfactant-free process for controlling particle number, particle size, and/or particle size distribution. The method of the invention also significantly improves monomer to polymer conversion rates, as well as, increases the level of polymer solids which can be emulsified/dispersed in water without polymer flocculation. Specifically, the improved process provides an aqueous dispersion of up to about 48% polymer solids in water in the absence of surfactant. The resulting fluoropolymers dispersions may be used in resin and coating applications.

PATENT INVENTORS This data is not available for free
PATENT ASSIGNEE This data is not available for free
PATENT FILE DATE September 12, 2000
PATENT PARENT CASE TEXT This data is not available for free
PATENT CLAIMS What is claimed is:

1. A resin comprising a fluoropolymer produced by a process comprising:

(a) reacting a mixture comprising a fluoroolefin, water and a radical initiator system comprising a reducing agent and an oxidizing agent wherein said radical initiator system is added in at least two charges, an initial charge and a continuous charge and wherein the amount of said reducing agent in the initial charge is from about 100 to about 10,000 PPM based upon the total weight of polymer produced and the amount of oxidizing agent in the initial charge is from about 100 to about 10,000 PPM based upon the total weight of polymer produced.

2. The resin of claim 1 wherein said fluoroolefin comprises chlorotrifluoroethylene and vinylidene fluoride.

3. The resin of claim 2 wherein the reaction mixture further comprises vinyl propionate
PATENT DESCRIPTION This data is not available for free
PATENT EXAMPLES This data is not available for free
PATENT PHOTOCOPY Available on request

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