Main > CLEANING > Detergents > Alkaline Formulation > Complexant

Product USA. H.

PATENT ASSIGNEE'S COUNTRY USA
UPDATE 07.99
PATENT ASSIGNEE This data is not available for free
PATENT CLAIMS Claim 9:
Process for inhibiting the formation of metal ion ppcc in alka
line clean. compn comprising
- Providing chelating soln
-- Hydroxyethylidene diphosphonic acid (0.01-5%)
-- Water (25-99.9%)
- Adding to above soln, at 10-45C & pH 1-3:
-- Alkyl polyglycoside (0.01-50%) (formula given)
-- Silicate comp (0.05-20%)
PATENT PHOTOCOPY Available on request

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