| PATENT ASSIGNEE'S COUNTRY | Japan |
| UPDATE | 08.99 |
| PATENT ASSIGNEE | This data is not available for free |
| PATENT CLAIMS |
Chemically amplified positive resist compn - Non-polymer dissolution inhibitive compd contg tert-alkyl ester group & MW < 3,000 & contg > 3 acid-decomposable groups in one molecule - Polymer dissolution inhibitive compd having p-hydroxysty rene structure of which part of phenolic -OH are protected by acetal groups & capable of increasing soly of compd in alkali aq soln by action of acid - Compd capable of generating acid by action of light - Organic basic compd |
| PATENT PHOTOCOPY | Available on request |
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