Main > PHOTORESIST > Stripping

Product Compn. Japan. T.

PATENT ASSIGNEE'S COUNTRY Japan
UPDATE 05.99
PATENT ASSIGNEE This data is not available for free
PATENT CLAIMS Remover soln with pH 5 - 8 comprising
- Ammonium fluoride (0.2 - 8 %)
- Dimethyl sulfoxide (30 - 90 %)
- Water
PATENT PHOTOCOPY Available on request

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