| PATENT ASSIGNEE'S COUNTRY | USA |
| UPDATE | 03.99 |
| PATENT ASSIGNEE | This data is not available for free |
| PATENT CLAIMS |
Method for removing resist layer having organic & inorganic residues - Ashing resist layer of device to form soluble organic compds from organic residues - Rinsing device in water to rinse away soluble organic com pds - Sputtering device in an etching & stripping chamber to spu tter away inorganic residues in resist layer |
| PATENT PHOTOCOPY | Available on request |
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