Main > ELECTRONICS. > SemiConductor > Copper Circuit SemiConductor > Chemical Mechanical Polish. (CMP) > Post-CMP Cleaning Solution

Product USA. E

PRODUCT Cleaning solution developed to remove residue on the latest generation of Cu circuit semiconductors. Development in cooperation with semiconductor toolmakers who now specify that his Co.’s prodt be used following CMP
CLASSIFICATION Market
SALES VALUE < $1 million in 2000
UPDATE 04.01
CONTACT This data is not available for free
LITERATURE REF. This data is not available for free
MARKETING BY This data is not available for free
PRODUCTION BY This data is not available for free

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