| PATENT ASSIGNEE'S COUNTRY | Japan |
| UPDATE | 05.99 |
| PATENT ASSIGNEE | This data is not available for free |
| PATENT CLAIMS |
- Forming soln by adding metallic organic compd having group which is dissociable from compd upon decompn of compd & which bonds with metal (M) in compd in C-M bond form to a liquid compd which consists of same group as dissociable group of compd - Decompn of metallic organic compd - Depositing film contg (M) from said compd onto substrate |
| PATENT PHOTOCOPY | Available on request |
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