| PATENT ASSIGNEE'S COUNTRY | USA |
| UPDATE | 03.00 |
| PATENT ASSIGNEE | This data is not available for free |
| PATENT CLAIMS |
A method for making a thermosetting anti-reflective coating compn exhibiting an etch selectivity to novolac- & poly(hydroxystyrene)-ba sed photoresists > 1.0 under oxygen plasma etch conditions, comprising (a) Forming a light-absorbing hydroxyl-functional aliphatic polyester resin by condensation methods (b) Purifying said resin by removal of residual solvents, starting materials, by-prodts & impurities from the resin by applying heat &/or vacuum, &/or by dissolving said resin in water-soluble solvent & precipitating the mixt into a large vol. of acidified water, after which the precipitated resin is collected & dried (c) Combining said polyester resin with an alkyla ted aminoplast crosslinker & protonic acid cure catalyst in a low-to-medium boiling solvent system wherein alc. comprises > 20%; & the overall formulation having total solids of 3-10% Whereby the anti-reflective coating compn so formed can be applied by spin coating onto semi conductor substrates & then baked at 120-225C to obtain uniform, crosslinked film which exhibits high optical d. at target exposing wavelength & shows no intermixing with subsequently applied photoresist |
| PATENT PHOTOCOPY | Available on request |
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