Main > COATINGS > Metallic Coatings > Electroplating > Pulse Current Method

Product DE. A

PATENT ASSIGNEE'S COUNTRY Germany
UPDATE 08.00
PATENT ASSIGNEE This data is not available for free
PATENT CLAIMS Method for the electrolytic deposition of fine crystalline metal coatings with uniform distribution of layer thicknesses & uniform brightness, high fracture elongation & tensile strength even in places of high current d. by means of a pulse current method comprising a duration of cathodic or cathodic & anodic pulses of current or voltage, comprising the steps
- a) Applying the pulse current on workpieces polarized as
cathodes &
- b) Using inert, dimensionally-stable insoluble anodes
coated with noble metals or oxides of noble metals
- c) From a deposition soln contg c1) Ions of the metal to be
deposited; c2) Additive compds for controlling the bright
ness, the fracture elongation & the tensile strength; c3)
Compds of at least one electrochemically reversible redox
system by means of the oxidised form of which the ions of
the metal to be deposited are formed by at least partial
dissolution of pieces of said metal
PATENT PHOTOCOPY Available on request

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