Main > PHOTORESIST > Stripping > Hydroxylamine-Free > Alpha-Me Naphthalene. Compn

Product USA. A

PATENT ASSIGNEE'S COUNTRY USA
UPDATE 01.99
PATENT ASSIGNEE Ashland
PATENT CLAIMS - Alpha-Me Naphthalene (40-80%)
- Linear monoalkylbenzene sulfonic acid surfactant (5-20%)
- Di-Me benzene sulfonic acid (1-10%)
- Phenol (5-20%)
PATENT PHOTOCOPY Available on request

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