| PATENT ASSIGNEE'S COUNTRY | Japan |
| UPDATE | 08.00 |
| PATENT ASSIGNEE | This data is not available for free |
| PATENT CLAIMS |
Which is hot applied to furnace refractories, or which prevents the deposition of C on furnace refractories, the glazing agent consisting of 100 parts of a thermal expansive ly modifier added to 100 parts of glazing agent consisting of as a glaze of the glazing layer on an oxide basis - Li2O (< 10%) - Boria (< 10%) - R2O (10-40%); where R = Na or K - SiO2 (Bal.) Wherein glaze has MP < 900C |
| PATENT PHOTOCOPY | Available on request |
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