| PATENT ASSIGNEE'S COUNTRY | USA |
| UPDATE | 07.00 |
| PATENT ASSIGNEE | Armstrong World Industries |
| PATENT CLAIMS |
Photopolymerizable, aq developable, organosol (plastisol) photoresist & solder mask coating compn - Plasticizer which is an ethylenically unsaturated photopoly merizable monomer (30-70%) based on resin + plasticizer - Particulate, TP resin which is soluble or dispersible in a basic aq soln & has midpoint Tg > 110C & an acid number > 110 at an amount (30-70%), wherein the resin is selected from: copolymer of styrene & maleic acid half ester & a copolymer of N-alkylacrylamide/alkylamino(meth)acrylate /(meth)acrylic acid - Tert. amine stabr present at amount (1-10 parts/100 parts of resin) & selected from: (Et)3N, N-Bu diethanol amine 4-Me-morpholine & di-Me aminoethanol - Photoinitiator - Volatilizable diluent |
| PATENT PHOTOCOPY | Available on request |
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