Main > ELECTRONICS. > SemiConductor > Device > Photoresist > Positive Photoresist > Polymer > Poly(Benzoxazole) Compn

Product USA. A. No. 2

PATENT ASSIGNEE'S COUNTRY USA
UPDATE 10.00
PATENT ASSIGNEE This data is not available for free
PATENT CLAIMS Silane diol & capped polybenzoxazole precursor contg the following units
- -[-CO-C6H4-CONH-C6H2(OH)(O-SO2-Z)-NH-]-
- -[-CO-C6H4-CONH-C6H2(OH)2-NH-]-
- -[-CO-C6H4-CONH-C6H4-NH-]-
Z = Cyclohexan-1,3-diene-5-(=N2)-6-one
PATENT PHOTOCOPY Available on request

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