Main > ELECTRONICS. > SemiConductor > Device > Photoresist > Positive Photoresist > Polymer > Poly(Benzoxazole) Compn

Product USA. A. No. 1

PATENT ASSIGNEE'S COUNTRY USA
UPDATE 11.00
PATENT ASSIGNEE This data is not available for free
PATENT CLAIMS - Polybenzoxazole precursor bearing acid labile functional
groups
- Photoacid generator
- Solvent
- Photosensitizer (optional)
PATENT PHOTOCOPY Available on request

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