| PATENT ASSIGNEE'S COUNTRY | USA |
| UPDATE | 04.00 |
| PATENT ASSIGNEE | This data is not available for free |
| PATENT CLAIMS |
A photolithographic sensitive coated substrate suitable for imagewise exposure to deep UV (193 nm) radiation, comprising - Substrate - Thermally cured UNDERCOAT on substrate, said thermal cured undercoat being a thermally cured polymer compn of a hydroxyl-contg polymer & a polyfunctional isocyanate cure agent, wherein the hydroxyl polymer comprises at least one monomer selected from: hydroxyalkyl (meth) acrylate, hydroxycycloalkyl (meth)acrylate, hydroxyalkyl cycloalkyl (meth)acrylate, allyl alc., said undercoat having been cured at 50-250C for < 3 min - A deep UV (193 nm) radiation-sens. photoresist topcoat on undercoat, said topcoat comprising a topcoat of a pho toresist compn comprising chemically amplified deep UV (193 nm) photosensitive polymer contg acid labile groups & a photoacid generating compd generating acid upon exposure to deep UV radiation |
| PATENT PHOTOCOPY | Available on request |
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