| TECHNOLOGY |
Proposed to solve the problem of "Acid Migration" which arises as an effect of "time delay" between exposure to UV light & baking of a wafer to consummate the reaction between protons & protected ester groups Photolysis of the onium salt liberates protons within the exposed area, but "delay" results in slow diffusion through the resin out of that area, eroding the resolution. Co.'s senior scientist (See author) proposed that a photoimageable base be used to trap migrating protons. Instead of the usual di-Ph iodonium heptafluorobutanesulfo nate, which produces protons free of the sulfonate counterion, the Co.'s investigators used di-Ph iodonium N-CYCLOHE XYLSULFAMATE. Photolysis of that acid generator leads to a zwitterion. In the unexposed areas, the sulfamate remains intact. If H ions migrate into unexposed areas, they are neutralized by the sulfamate N |
| UPDATE | 09.99 |
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