| PATENT ASSIGNEE'S COUNTRY | USA |
| UPDATE | 04.00 |
| PATENT ASSIGNEE | This data is not available for free |
| PATENT CLAIMS |
- Blending at least one alkoxysilane with a solvent compn & optional water, thus forming a mixt & causing a partial hydro lysis & condensation of the alkoxysilane - Depositing mixt onto substrate while evaporating at least portion of solvent compn - Placing substrate in sealed chamber & evacuating the chamber to pressure < 1 atm - Exposing substrate to water vapor or to base vapor at < 1 atm - Exposing substrate to water vapor if the substrate is expo sed to base vapor in previous step, or to base vapor if the substrate is exposed to water vapor in previous step |
| PATENT PHOTOCOPY | Available on request |
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