| PATENT ASSIGNEE'S COUNTRY | USA |
| UPDATE | 08.00 |
| PATENT ASSIGNEE | Alcon Labs |
| PATENT CLAIMS |
- Polishing the article by charging a receptacle with a poli shing slurry & article to be polished, & agitating the recepta cle for period of time & speed sufficient to remove surface irregularities from the article, wherein slurry consists of polishing beads, alumina & non-aq swelling agent selected from aliphatic hydrocarbons, chlorinated solvents & aroma tic hydrocarbons - Cleaning the polished article by contacting it with a cleaning slurry in a receptacle & agitating the receptacle for time & speed sufficient to clean the surface, wherein the cleaning slurry comprises cleaning beads, alumina, surfactant & non-aq solvent selected from: aliphatic hydrocarbons, chlorinated solvents, & aromatic hydrocarbons Wherein Alumina/Surfactant = 1:1 |
| PATENT PHOTOCOPY | Available on request |
|
Want more information ? Interested in the hidden information ? Click here and do your request. |