| PATENT ASSIGNEE'S COUNTRY | USA |
| UPDATE | 03.00 |
| PATENT ASSIGNEE | Alchemia |
| PATENT CLAIMS |
- Polymeric substrate - Plasma etch modification to form micro-roughened surface - First metal nitride layer - Second metal nitride layer dissolvable in alkali etchant - Third Electroconductive metal layer |
| PATENT PHOTOCOPY | Available on request |
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