| PATENT ASSIGNEE'S COUNTRY | USA |
| UPDATE | 10.00 |
| PATENT ASSIGNEE | Air Products & Chemicals |
| PATENT CLAIMS |
In an aq photoresist developer compn contg a surfactant, the IMPROVEMENT which comprises using as surfactant an alkylated aminoalkylpiperazine compd of structure - R-(Piperazine)-(CH2)n-NH-R' R = 5-14C alkyl or cycloalkyl & R' = H or both R & R' are 5-8C alkyl & n = 2-3 |
| PATENT PHOTOCOPY | Available on request |
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