| PATENT ASSIGNEE'S COUNTRY | USA |
| UPDATE | 09.00 |
| PATENT ASSIGNEE | Air Products & Chemicals |
| PATENT CLAIMS |
In an aq photoresist developer compn contg a surfactant, the IMPROVEMENT which comprises using as surfactant an N,N-dialkyl urea compd - RR'N-CO-NH2 R,R' are 1-6C alkyl or cycloalkyl, the sum of C = 6-12 |
| PATENT PHOTOCOPY | Available on request |
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