Main > COATINGS > Metallic Coatings > Copper > CVD Process > Ligand > CF3-CO-CH2-CO-CF3 > Cu(I). Complex > Production

Product USA. A

PATENT ASSIGNEE'S COUNTRY USA
UPDATE 08.00
PATENT ASSIGNEE This data is not available for free
PATENT CLAIMS Claim 18
In a process for synthesis of Cu(I)[CF3COCH2COCF3 (A)][
Trimethylvinylsilane (B)], from Cu(I) oxide, a ligand precursor of (A) & (B); the IMPROVEMENT to suppress the formation of Cu(II)(A)2,
- By adding elemental particulate Cu to synthesis of Cu(I)(A)
(B)
(B) = Stabilizing ligand
PATENT PHOTOCOPY Available on request

Want more information ?
Interested in the hidden information ?
Click here and do your request.


back