| PATENT ASSIGNEE'S COUNTRY | USA |
| UPDATE | 11.99 |
| PATENT ASSIGNEE | Air Products & Chemicals |
| PATENT CLAIMS | Process for the deposition on substrate of a film of SiO2 &/or Si oxynitride by reacting bis(tert. butylamino)silane at elev T with oxygen |
| PATENT PHOTOCOPY | Available on request |
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