Main > GASES > Hydrogen Chloride Gas > Moisture Removal

Product USA. A

PATENT ASSIGNEE'S COUNTRY USA
UPDATE 09.99
PATENT ASSIGNEE Air Products & Chemicals
PATENT CLAIMS Method of removing water from gaseous HCl wherein the water contained in HCl is at a partial pressure of 0.01-0.5 torr by
- Passing the HCl stream over adsorbent contg 5-15% of
MgCl2 supported on activ C
PATENT PHOTOCOPY Available on request

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